Atomic Layer Infiltration and Deposition for Functional Hybrid Materials
2023 Workshop
September 10th - September 13th, 2023
Technion- Israel Institute of Technology, Haifa, Israel
Atomic layer deposition (ALD)-based processes have expanded in recent years. ALD based methods such as atomic layer infiltration (ALI), sequential infiltration synthesis (SIS), and vapor phase infiltration (VPI) allow for infiltration of precursors into polymers and organic materials, therefore transforming them into hybrid materials. Molecular layer deposition (MLD), which can use organic precursors in addition to the inorganic ones can fabricate hybrid organic-inorganic and organic molecular layers.
ALI (VPI, SIS) and MLD have created a wide arsenal of materials and processes that contribute to fields spanning from energy storage and water filtration to semiconductor nanofabrication and optical coatings.
The 3rd Atomic Layer Infiltration and Deposition for Functional Hybrid Materials 2023 Workshop will be a four-day workshop, focusing on the science and technology of ALI and MLD and providing an opportunity for a fruitful exchange of ideas and designing new paths for collaborative research.
Location
Department of Chemical Engineering,
Technion, Haifa, Israel.
In order to get in to the Technion by car, please tell the guards at the gate about your visit purpose - Chemical Engineering Workshop
Although there is no problem getting inside the Technion by private car, we ask you to park outside the Technion since there are no public parking areas available inside.
You can find a parking lot outside the Technion Gates.
For those arriving by train or bus, you can use the new cable car from Lev Hamfaretz station to the Technion.
Sponsored by:
Research Workshop of the Israel Science Foundation
